antireflection film
英
美
网络 抗反射膜; 增透膜; 减反射膜
双语例句
- Development of 400-1100 nm Antireflection Film Based on Glan-Taylor Prism
400-1100nm波段用于格兰泰勒棱镜减反射膜的研制 - Improving the Collecting Efficiency of Light by a Semiconductor Single-Photon Emitter Using Double Antireflection Film
用双层增透膜提高半导体单光子发射器的收集效率 - The studies suggest that the antireflection coating has excellent properties as the result of film design, and will be widely used in the fiber optical communication industries and laser field.
研究表明，以膜系设计的结果为参照，实际所镀膜层性能优异，在光纤通讯和激光领域具有广阔的应用前景。 - It is very difficult to realize the high efficient antireflection ( AR) film coating on the facets of laser diode with the conventional monitoring technique for control the film thickness.
采用常规膜厚监控方法在二极管激光器端面镀高效减反射膜有很多困难。 - The fabrication of high reflection film of resonator mirror, wide band infrared antireflection film of CaF 2 window and con aperture splitter film of DF laser system has been reported. The tested results of thermal distortion and damage experiments have been introduced.
报道了氟化氘（DF）激光系统腔镜高反射膜、CaF2窗口红外宽带增透膜和共孔径分光镜的研制，并介绍了DF腔镜高反射膜的热畸变和损伤实验测试结果。 - A new spray deposition method of tin oxide antireflection thin film and study of the material
一种喷涂SnO2减反射薄膜的新工艺及材料研究 - The results of antireflection thin film systems for single crystal CaF2 and silicon windows for application at DF laser wavelengths have been present in this paper.
表述了DF激光波段采用CaF2和硅窗口减反射膜系的结果。 - STUDY OF ANTIREFLECTION FILM ON ITO SURFACE OF AMORPHOUS SILICON SOLAR CELL ITO/ N+ IP+ a-Si/ SS The design and fabrication of wide band infrared anti reflection film on Ge substrate micro optical components by ion beam assisted deposition are reported.
不锈钢带为衬底的非晶硅太阳电池表面减反膜的研究简要叙述了锗基片微光学元件红外宽带减反膜的设计与制作。 - A New Type of Antireflection Film: DLC and Doped DLC Film
一种新型的光学增透膜&DLC及改性DLC薄膜 - Improve the Uniformity of 8-element IR Detector by Deposition of Antireflection Film
淀积增透膜改善8元红外探测器的均匀性 - Theoretical Analysis and Evaporation of SiO Antireflection Film
一氧化硅减反射涂层的理论分析和蒸镀 - Latest development of study and application on super-luminescent diode ( SLD) were reviewed. The effect of the structures included active area, rear absorption area as well as antireflection film of light emitting facet on the spectral characteristics were analyzed.
分析了超辐射激光二极管（Super-LuminescentDiode，SLD）SLD管芯的有源区、后端吸收区以及出光端面的增透膜对光谱的影响。 - Effective monitoring of antireflection film thickness coated on the semiconductor laser facets
半导体激光器端面镀膜厚度的有效监控 - Study of multi-layer antireflection coating by using character matrix of multi-layer dielectric film
用传输矩阵方法研究多层介质增透膜的透射特性 - And the light trapping structure mostly is surface texture and evaporated antireflection film: ① for solar cells based on single crystalline silicon wafers, diamond textures were mostly adopted using alkali eroding method;
单晶硅绒面电池的表面常采用碱腐蚀方法在表面构造金字塔结构； - A superluminescent diode is fabricated by means of evaporation of SiO antireflection film for 1.3 μ m LDs cavity Surfaces.
并通过对1.3μm激光器前后腔面蒸镀SiO减反射膜而制成了超发光二极管。 - In first part, in order to optimize the antireflection effect of the double-layer film, reflection spectra of the SiNx/ SiO2 double-layer film was calculated by Matlab program and the optimal parameters of the film series were obtained theoretically.
在模拟部分中，为优化SiO2/SiNx双层膜的减反射作用，本文首先采用Matlab程序计算SiO2/SiNx双层膜的反射谱，从理论上获得最优的膜系组合。 - The characteristic matrix of the film derives from the basis of Maxwell equation which was utilized to analyzing antireflection film theory of the single-layer film and multilayer films.
运用薄膜的特征矩阵，对单层增透膜和多层增透膜原理进行了分析，建立了多层膜干涉截止滤光片的理论模型。